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- Over 57 acres available
- Minimum 4 acre customized lots
- Purchase or lease land
- Fully improved sites
- Minutes from I-90, I-480 and Ohio Turnpike (I-80)
- Wooded park setting for business campus
- Technology park zoning permits office, R&D, or light assembly uses
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Entrepreneurship Innovation Center Quick Facts |
- Brand new, class A office building
- 2,200 - 22,000 SF customizable spaces available
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The Great Lakes Technology Park is an Exciting and Unique Opportunity in Northern Ohio
The Great Lakes Technology Park provides unique amenities and technological capabilities in a professional, park-like setting. Building sites can be customized to fit your needs on a minimum lot of four acres. Companies locating in The Great Lakes Technology Park have access to the business incubation and consulting services of GLIDE, high speed internet access, network and computing infrastructure from the Third Frontier Network, technology expertise, manufacturing and industrial training resources, software development services, research laboratories, a skilled workforce, business and organizational development programs, state-of-the-art conference and meeting spaces, and many other college amenities. Bring your business to the Great Lakes Technology Park and build relationships with others who have chosen to co-locate with LCCC.
Location/Access
The Great Lakes Technology Park is conveniently located adjacent to the campus of LCCC in Elyria, Ohio. It is minutes away from interstates 90 and 480 and the Ohio Turnpike.
Access to Cleveland Hopkins International Airport and the Lorain County Regional Airport is easy and takes less than 30 minutes. The Great Lakes Technology Park is situated between the bustling City of Cleveland and the relaxing Lake Erie Islands. By virtue of its location you can get to more than 50 percent of the country, including major U.S. cities and Ontario, Canada, in less than a day's drive or a few hours of flight time.
For more information, contact Dennis Cocco at 440-366-4318. Or e-mail dcocco@lorainccc.edu.